| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a novel Group 3a ink composition designed so as to make it easy to deposit the Group 3a ink on a substrate and capable of avoiding danger of hydrazine explosion, a method for producing the same, and a method for depositing the Group 3a material on the substrate for use in a variety of semiconductor applications such as metallization of silicon devices in VLSI technology, the growth of semiconducting III-V alloys, thin film transistors (TFTs), light emitting diodes (LEDs) and infrared detectors. <P>SOLUTION: The Group 3a ink comprises a polyamine solvent, a Group 3a material/organic complex, and a reducing agent as initial components, wherein the molar concentration of the reducing agent exceeds the molar concentration of the Group 3a material/organic complex, and the Group 3a ink is a stable dispersion and contains no hydrazine and hydrazinium. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
