REFLECTIVE EXPOSURE MASK, METHOD OF FABRICATING REFLECTIVE EXPOSURE MASK, METHOD OF INSPECTING REFLECTIVE EXPOSURE MASK, AND METHOD OF CLEANING REFLECTIVE EXPOSURE MASK

摘要

According to one embodiment, a reflective exposure mask comprises a first layer formed on a substrate and including a first light absorbing part which absorbs exposure light and a light reflecting part which reflects the exposure light, and a second layer formed on the light reflecting part and including a second light absorbing part which absorbs the exposure light.