| 摘要 |
The invention relates to a method for the surface treatment of work pieces in a vacuum treatment system, comprising a first electrode that is designed as target and is part of an arc evaporation source, wherein over the first electrode a spark is operated with spark flow, by which material from the target is evaporated, which is at least partially and at least some of the time deposited on the work pieces, and further comprising a second electrode, designed as work piece holder and forming a bias electrode together with the work pieces, wherein a bias voltage is applied to the bias electrode by means of a voltage source, wherein the bias voltage is applied in accordance to the spark flow such that in net terms substantially no material build-up takes place on the surface. |
