发明名称 FILM-FORMING METHOD
摘要 The method for depositing a film of the present invention comprises the first irradiation step of irradiating particles having energy on a surface of a substrate 101, the first film deposition step of depositing a first film 103 on the surface of the substrate 101 subjected to the first irradiation step by using a dry process, and the second film deposition step of depositing a second film 105 having oil repellency on a surface of the first film 103. According to the present invention, a method for depositing a film enabling production of an oil-repellent substrate comprising an oil-repellent film having abrasion resistance of a practically sufficient level can be provided.
申请公布号 EP2336384(A1) 申请公布日期 2011.06.22
申请号 EP20090819060 申请日期 2009.08.24
申请人 SHINCRON CO., LTD. 发明人 SHIONO, ICHIRO;NAGAE, EKISHU;JIANG, YOUSONG;SUGAWARA, TAKUYA
分类号 C23C14/02;C03C17/42;C23C14/00;C23C14/34;C23C14/50;C23C14/56;H01J37/34 主分类号 C23C14/02
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