Lithographic apparatus comprising a Mo/Si-multilayer with capping layer,申请号EP20030255276-传众专利搜索

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发明名称	Lithographic apparatus comprising a Mo/Si-multilayer with capping layer
摘要
申请公布号	EP1394815(B1)	申请公布日期	2011.06.22
申请号	EP20030255276	申请日期	2003.08.26
申请人	ASML NETHERLANDS B.V.;CARL ZEISS SMT GMBH	发明人	KURT, RALPH;YAKSHIN, ANDREI E. L.
分类号	G21K1/06	主分类号	G21K1/06
代理机构		代理人
主权项
地址

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