发明名称 |
Photon source based on localised exciton recombination |
摘要 |
<p>The source has a semiconductor layer (24) i.e. silicon layer, whose central part is framed with highly doped regions (28, 29). A layer portion i.e. insulating layer (25), is formed above the central part of the semiconductor layer, and contains elements i.e. nanocrystals (26), activated by excitons. One metallization part i.e. metal electrode (22) out of two parts, comprises side extension ranging from lambda-0/10xn-e to lambda-0/2xn-e, where lambda-0 is a wavelength in a vacuum of emitted light and n-e is effective mode index formed in a cavity formed by two metallization parts. An independent claim is also included for a method for fabricating a photons source.</p> |
申请公布号 |
EP2337094(A1) |
申请公布日期 |
2011.06.22 |
申请号 |
EP20100195018 |
申请日期 |
2010.12.14 |
申请人 |
COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIESALTERNATIVES;CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE;STMICROELECTRONICS (GRENOBLE 2) SAS |
发明人 |
ESPIAU DE LAMAESTRE, ROCH;GREFFET, JEAN-JACQUES;GUILLAUMOT, BERNARD;ESTEBAN LLORENTE, RUBEN |
分类号 |
H01L33/00;H01L33/06;H01L33/40;H01L33/46 |
主分类号 |
H01L33/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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