| 摘要 |
PURPOSE: A method for manufacturing a thin film transistor array substrate is provided to reduce the width of a non-display area by shielding signal between a data line and a pixel electrode. CONSTITUTION: A method for manufacturing a thin film transistor array substrate comprises steps of: forming a gate electrode(20a), a storage capacitor lower pattern(20b), a pixel electrode pattern, a common electrode pattern, and a first pattern for a gate pad on a substrate using a first mask process; forming a gate insulation pattern, a semiconductor pattern, and a gate pad contact hole through a second mask process; forming a source electrode, a drain electrode, a storage capacitor upper pattern, a data line, and a second pattern for a gate pad; and forming a first and a second protective patterns(34b). |
