| 摘要 |
PURPOSE: Improved polarization designs for a lithography device are provided to improve the validity of a source mask optimization by introducing an additional degree of freedom on the side of a source with polarization control. CONSTITUTION: An illuminator(IL) conditions a radiation beam(B). A mask table(MT) supports a patterning device(MA). A substrate table(WT) maintains a substrate(W). The substrate table is connected to a second position setter(PW) to accurately position the substrate according to preset parameters. A projection system(PS) projects the pattern given by the radiation beam on the target of the substrate by a patterning device. |
