SILICON NANODOTS CLUSTERS AND METHOD OF PREPARING THE SAME

摘要

PURPOSE: A silicon nanodot cluster and a producing method thereof are provided to reduce the size and the combining density of the silicon nanodot cluster by pre-processing a substrate. CONSTITUTION: A producing method of a silicon nanodot cluster comprises the following steps: surface-processing a GaN substrate with an RCA solution or a piranha solution(S1); and producing the silicon nanodot cluster on the surface-processed GaN substrate by a plasma chemical vapor deposition method(S2). The RCA solution contains 10~25vol% of hydrogen peroxide, 10~25col% of ammonia solution, and 50~80vol% of water.