| 摘要 |
Apparatus for performing both X-ray diffraction (XRD) and X-ray fluorescence (XRF) analysis of a sample 104 comprises X-ray source 102, sample holder 105, and combined XRD and XRF detection arrangement 110 comprising a scanning wavelength selector (wavelength dispersive element) 112 and at least one detector D1 for detecting X-rays selected by the wavelength selector. The sample is irradiated with X-rays and XRD analysis of the sample performed by selecting at least one fixed wavelength of X-rays diffracted by the sample using the wavelength selector and detecting them at one or more values of the diffraction angle at the sample; and/or XRF analysis of the sample performed by scanning wavelengths of X-rays emitted by the sample using the wavelength selector and detecting them. The apparatus may also include second detector D2, goniometers 140, 142, 150 and collimators 106, 114, 117. |
