发明名称 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND RECORD MEDIUM STORING PROGRAM FOR EXECUTING THE ABOVE SUBSTRATE PROCESSING METHOD
摘要 <p>PURPOSE: A substrate processing device, substrate processing method, and recording medium storing a program for executing the substrate processing method are provided to uniformly support the entire substrate. CONSTITUTION: A loading stage(150) includes a stage surface installed in a carrying path(34). The loading stage loads a processed substrate on the stage surface. A first rotator can rotate along with an axis expanded from the lower part of the stage surface to the carrying path. A second rotator(170) can rotate along with an axis independently from the first rotator.</p>
申请公布号 KR20110068842(A) 申请公布日期 2011.06.22
申请号 KR20100118573 申请日期 2010.11.26
申请人 TOKYO ELECTRON LIMITED 发明人 OTA YOSHIHARU
分类号 H01L21/677;H01L21/027 主分类号 H01L21/677
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