| 发明名称 |
Sulfonyl photoacid generators and photoresists comprising same |
| 摘要 |
New bis(sulfonyl)imide and tri(sulfonyl)methide photoacid generator compounds ("PAGs") are provided as well as photoresist compositions that comprise such PAG compounds. |
| 申请公布号 |
EP2336826(A2) |
申请公布日期 |
2011.06.22 |
| 申请号 |
EP20100194879 |
申请日期 |
2010.12.14 |
| 申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS LLC |
发明人 |
LIU, CONG;XU, CHENG-BAI |
| 分类号 |
G03F7/004 |
主分类号 |
G03F7/004 |
| 代理机构 |
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代理人 |
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