| 发明名称 |
Lithographic apparatus and device manufacturing method |
| 摘要 |
Lithographic apparatus using an array of individually controllable elements in which a fraction of the intensity of the beam of radiation patterned by the array of individually controllable elements is diverted to an image sensor for verifying the quality of the image generated.
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| 申请公布号 |
US7965380(B2) |
申请公布日期 |
2011.06.21 |
| 申请号 |
US20070703823 |
申请日期 |
2007.02.08 |
| 申请人 |
ASML NETHERLAND B.V. |
发明人 |
BLEEKER ARNO JAN;TROOST KARS ZEGER |
| 分类号 |
G03B27/72;G03B27/42;G03B27/54 |
主分类号 |
G03B27/72 |
| 代理机构 |
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