发明名称 |
HIGH REPELLENCY MATERIALS VIA NANOTOPOGRAPHY AND POST TREATMENT. |
摘要 |
<p>A method is provided for making a high repellency material. In one embodiment the method includes the steps of providing a polymeric material having an external surface including particle-like nanotopography, etching the external surface with a high energy treatment; and depositing a fluorochemical onto the etched external surface by a plasma fluorination process.</p> |
申请公布号 |
MX2011005535(A) |
申请公布日期 |
2011.06.21 |
申请号 |
MX20110005535 |
申请日期 |
2009.11.25 |
申请人 |
KIMBERLY-CLARK WORLDWIDE, INCORPORATED |
发明人 |
ROGER B. QUINCY III;ALI YAHIAOUI. |
分类号 |
B01J19/08;B82B3/00;C09K3/18 |
主分类号 |
B01J19/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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