发明名称 |
Structure for pattern formation, method for pattern formation, and application thereof |
摘要 |
A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
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申请公布号 |
US7965446(B2) |
申请公布日期 |
2011.06.21 |
申请号 |
US20070867842 |
申请日期 |
2007.10.05 |
申请人 |
DAI NIPPON PRINTING CO., LTD. |
发明人 |
KOBAYASHI HIRONORI;YAMAMOTO MANABU;AOKI DAIGO;KAMIYAMA HIRONORI;HIKOSAKA SHINICHI;KASHIWABARA MITSUHIRO |
分类号 |
G02B27/10;B41C1/10;B41N1/00;G03F7/00;G03F7/004;G03F7/075 |
主分类号 |
G02B27/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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