发明名称 Structure for pattern formation, method for pattern formation, and application thereof
摘要 A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
申请公布号 US7965446(B2) 申请公布日期 2011.06.21
申请号 US20070867842 申请日期 2007.10.05
申请人 DAI NIPPON PRINTING CO., LTD. 发明人 KOBAYASHI HIRONORI;YAMAMOTO MANABU;AOKI DAIGO;KAMIYAMA HIRONORI;HIKOSAKA SHINICHI;KASHIWABARA MITSUHIRO
分类号 G02B27/10;B41C1/10;B41N1/00;G03F7/00;G03F7/004;G03F7/075 主分类号 G02B27/10
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