发明名称 Method and apparatus for photomask etching
摘要 A method of fabricating yttria parts is provided herein. In one embodiment, the method includes sintering a yttria sample, machining the sintered sample to form a part, and annealing the part in a three-stage process that includes heating the part at a predetermined heating rate, maintaining the part at a constant annealing temperature, and cooling the part at a predetermined cooling rate.
申请公布号 US7964818(B2) 申请公布日期 2011.06.21
申请号 US20060554482 申请日期 2006.10.30
申请人 APPLIED MATERIALS, INC. 发明人 RYABOVA ELMIRA;LEWINGTON RICHARD;CHANDRACHOOD MADHAVI R.;SABHARWAL AMITABH;BIVENS DARIN
分类号 B23K10/00 主分类号 B23K10/00
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