| 摘要 |
PURPOSE: A surface treatment device of a semiconductor substrate and a method thereof is provide to prevent a watermark by rinsing dilute IPA before a dry process and processing pattern surface with water-repellent agent. CONSTITUTION: A substrate holding support rotating unit(100) supports a substrate(W). The substrate holding support rotating unit comprises a spin cup(101), a rotary shaft(102), a spin base(103), and a chuck pin(104). A dilute IPA feed port(200) supplies diluted IPA to a substrate which is supported by the substrate holding support rotating unit. An IPA is stored in a buffer tank(220) through a supply line. A liquid medicine supply unit(300) supplies IPA, deionized water, and a water-repellent on the surface of a substrate. |
