<p>PURPOSE: A method for manufacturing field effect transistor is provided to increase production by simultaneously forming a gate electrode and an electric field electrode in a first opening and a second opening . CONSTITUTION: In a method for manufacturing field effect transistor, an active layer(12) and a capping layer(14) are laminated on a substrate(10). A source electrode(16) and a drain electrode(18) are formed on the capping layer. An insulating layer(20) and a first resist layer(28) are successively formed in the top of the substrate. A first opening(32) and a second opening(34) are formed on the first resist layer. The gate electrode and electric field electrodes are formed within the first opening and the second opening at the same time.</p>
申请公布号
KR20110066624(A)
申请公布日期
2011.06.17
申请号
KR20090123356
申请日期
2009.12.11
申请人
ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
发明人
AHN, HO KYUN;LIM, JONG WON;YOON, HYUNG SUP;CHANG, WOO JIN;KIM, HAE CHEON;NAM, EUN SOO