发明名称 |
MULTI-LAYER THIN FILM FOR OPTICAL INTERFERENCE INLIGHT-EMITTING DIODES |
摘要 |
PURPOSE: A thin film for preventing optical interference reflection light of light emitting diodes is provided to perform a manufacturing process and to prevent efficiently reflection light by using a low-temperature deposition method. CONSTITUTION: A thin film for preventing optical interference reflection light includes a lamination structure of a semitransparent metal thin film, an optical transmitting thin film, and a full reflection metal thin film, The optical transmitting thin film is composed of a compound of group I-VII. The compound of group I-VII is KCl or KBr. The optical transmitting thin film is formed with the thickness of 50-700Å. The semitransparent thin film is formed with a metal thin film of 10-200Å. |
申请公布号 |
KR20110066760(A) |
申请公布日期 |
2011.06.17 |
申请号 |
KR20090123531 |
申请日期 |
2009.12.11 |
申请人 |
HOSEO UNIVERSITY ACADEMIC COOPERATION FOUNDATION |
发明人 |
KIM, WOO YOUNG;KIM, YOU HYUN |
分类号 |
G02B1/11;H01L51/50 |
主分类号 |
G02B1/11 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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