发明名称 |
MATHOD FOR FORMING MOLD FOR IMPRINTING AND METHOD FOR FORMING PATTERN USING MOLD FOR IMPRINTING |
摘要 |
<p>PURPOSE: A method for forming a mold for imprinting and a method for forming a pattern using the mold are provided to prevent the increase of a process step and manufacturing costs by forming the multilayer fine pattern of a liquid crystal display through one mold for imprint. CONSTITUTION: In a method for forming a mold for imprinting and a method for forming a pattern using the mold, a metal layer is formed on a substrate(100). A first photo resist pattern is formed on the metal layer. A substrate is etched by using a first photo resist pattern as an etch mask to form a first pattern. The first photo resist pattern is etched to form a second photoresist pattern. A substrate is etched by using a second photo resist pattern as an etch mask to form a second pattern.</p> |
申请公布号 |
KR20110066812(A) |
申请公布日期 |
2011.06.17 |
申请号 |
KR20090123605 |
申请日期 |
2009.12.11 |
申请人 |
LG DISPLAY CO., LTD. |
发明人 |
JANG, DOO HEE;KWON, DHANG;CHO, HANG SUP;KIM, HO SU |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|