发明名称 MATHOD FOR FORMING MOLD FOR IMPRINTING AND METHOD FOR FORMING PATTERN USING MOLD FOR IMPRINTING
摘要 <p>PURPOSE: A method for forming a mold for imprinting and a method for forming a pattern using the mold are provided to prevent the increase of a process step and manufacturing costs by forming the multilayer fine pattern of a liquid crystal display through one mold for imprint. CONSTITUTION: In a method for forming a mold for imprinting and a method for forming a pattern using the mold, a metal layer is formed on a substrate(100). A first photo resist pattern is formed on the metal layer. A substrate is etched by using a first photo resist pattern as an etch mask to form a first pattern. The first photo resist pattern is etched to form a second photoresist pattern. A substrate is etched by using a second photo resist pattern as an etch mask to form a second pattern.</p>
申请公布号 KR20110066812(A) 申请公布日期 2011.06.17
申请号 KR20090123605 申请日期 2009.12.11
申请人 LG DISPLAY CO., LTD. 发明人 JANG, DOO HEE;KWON, DHANG;CHO, HANG SUP;KIM, HO SU
分类号 H01L21/027 主分类号 H01L21/027
代理机构 代理人
主权项
地址