发明名称 Crystalline Silicon Formation Apparatus
摘要 In a crystalline silicon formation apparatus, a quick cooling method is applied to the bottom of a crucible to control a growth orientation of a polycrystalline silicon grain, such that the crystal grain forms twin boundary, and the twin boundary is a symmetric grain boundary, and the crystal grain is solidified and grown upward in unidirection to form a complete polycrystalline silicon, such that defects or impurities will not form in the polycrystalline silicon easily.
申请公布号 US2011142730(A1) 申请公布日期 2011.06.16
申请号 US20090637403 申请日期 2009.12.14
申请人 LAN C W;KIMSAM-HSIEH;YU WEN-HUAI;HSU BRUCE;TSAI YA-LU;HSU WEN-CHING;HO SZU-HAU 发明人 LAN C.W.;KIMSAM-HSIEH;YU WEN-HUAI;HSU BRUCE;TSAI YA-LU;HSU WEN-CHING;HO SZU-HAU
分类号 B01D9/00 主分类号 B01D9/00
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