| 摘要 |
The invention relates to a honeycomb condenser (5, 12, 15, 100, 200, 300, 400, 500, 550), particularly for a microlithographic projection exposure system, comprising at least three arrangements (110-130, 310-340, 410-440) of beam-deflecting optical elements (111, 112,...; 121, 122,...; 131, 132,...; 311, 312,...; 411, 412,...) for producing a plurality of optical channels, said arrangements being provided successively in the light-propagation direction, wherein at least two of the aforementioned optical channels have a different cross-section in at least one of the aforementioned arrangements. |
