发明名称 FILM DEPOSITION APPARATUS
摘要 PURPOSE: A film forming apparatus is provided to prevent the degradation of a deposition rate by reducing the dilution of a first gas and a second gas. CONSTITUTION: A spinning table(2) having rotation center is arranged at the center of a vacuum container(1). The vacuum container separates a top plate from a container. The top plate is attached to the container. A rotary shaft(22) and a driving part(23) are accepted within a cylindrical case(20). A first reaction gas providing unit supplies a first reaction gas to a first side. A second reaction gas providing unit supplies a second reaction gas to a first side of the spinning table.
申请公布号 KR20110066096(A) 申请公布日期 2011.06.16
申请号 KR20100125335 申请日期 2010.12.09
申请人 TOKYO ELECTRON LIMITED 发明人 KATO HITOSHI;HONMA MANABU;ORITO KOHICHI;TAKEUCHI YASUSHI;KIKUCHI HIROYUKI
分类号 H01L21/205 主分类号 H01L21/205
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