发明名称 PLASMA IGNITION DEVICE, PLASMA IGNITION METHOD, AND PLASMA GENERATION DEVICE
摘要 <p>Disclosed is a plasma ignition technology capable of easily and reliably igniting and reigniting plasma without monitoring or human intervention thereupon. The plasma ignition device comprises a high-frequency power supply device (101) that generates and supplies a prescribed high-frequency signal (HS) to an anode (114) for plasma generation; a coordination device (105) that coordinates the impedance upon the high-frequency power supply device and the anode; a progressive wave/reflected wave detection device (102) that detects the progressive waves and the reflected waves of the high-frequency signal (HS); a high-voltage generation device (103) that generates a prescribed high voltage (HV); and a control device (100) that superimposes the high voltage (HV) upon the high-frequency signal (HS) when the ratio of reflected waves to progressive waves exceeds a first threshold.</p>
申请公布号 WO2011070819(A1) 申请公布日期 2011.06.16
申请号 WO2010JP62780 申请日期 2010.07.29
申请人 SHINKAWA LTD.;TOKYO HY-POWER LABS., INC.;UTANO, TETSUYA;MAEDA, TORU;TAKAHIRA, JUN'ICHI;HAMAJIMA, MASANORI 发明人 UTANO, TETSUYA;MAEDA, TORU;TAKAHIRA, JUN'ICHI;HAMAJIMA, MASANORI
分类号 H05H1/46;H01L21/02;H05H1/00;H05H1/30 主分类号 H05H1/46
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