| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a solid imaging apparatus which can form an optical waveguide without using a photolithography method or anisotropic dry etching which causes optical characteristic deterioration. <P>SOLUTION: The method of manufacturing the solid imaging apparatus includes: a process (A) for forming a plurality of light receiving portions in matrix on a surface layer of a semiconductor substrate; a process (B) for forming a plurality of projections on the semiconductor substrate to surround the plurality of light receiving portions respectively; a process (C) for forming recessed seam portions on an interlayer insulating film right above the respective light receiving portions by depositing the interlayer insulating film on the semiconductor substrate to cover the plurality of projections; a process (D) for forming holes for forming an optical waveguide, which are formed by enlarging the respective seam portions, right above the respective light receiving portions by isotropic etching of the interlayer insulating film; and a process (E) for forming the optical waveguides right above the respective light receiving portions by filling translucent material in the respective holes for forming an optical waveguide. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
