发明名称 LITHOGRAPHIC PELLICLE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a pellicle which is minimized in cracked gas generation and haze generation even when ArF excimer laser radiation impinges against a pressure-sensitive adhesive layer on an inner wall during long-term service. <P>SOLUTION: The pellicle comprises a pellicle film 1, a pellicle frame 3, and a pressure-sensitive adhesive layer 2, in which the pellicle film is stretched across and mounted on the upper end face of the pellicle frame, and the pressure-sensitive adhesive layer is disposed on the lower end face of the pellicle frame so that the pellicle frame can be attached to a substrate. The pellicle further has an inner wall pressure-sensitive adhesive layer on the inner wall of the pellicle frame, the layer formed of a cured product of a curable composition containing a perfluoro compound having a perfluoro structure in the main chain. <P>COPYRIGHT: (C)2011,JPO&INPIT</p>
申请公布号 JP2011118091(A) 申请公布日期 2011.06.16
申请号 JP20090274283 申请日期 2009.12.02
申请人 SHIN-ETSU CHEMICAL CO LTD 发明人 SHIRASAKI SUSUMU;FUKUDA KENICHI
分类号 G03F1/62;G03F1/64;H01L21/027 主分类号 G03F1/62
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