发明名称 NITRIDE SEMICONDUCTOR ELEMENT AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a nitride semiconductor element that improves the efficiency of light emission. SOLUTION: A nitride semiconductor laser element 100 (nitride semiconductor element) includes a GaN substrate 10 in which a plane having an off angle in an a-axis direction with regard to an m plane is made a major growth plane 10a, and nitride semiconductor layers 11-18 formed on the major growth plane 10a of the GaN substrate 10. A semiconductor layer contacting with the major growth plane 10a is an InGaN layer 11 (nitride semiconductor layer containing In). Moreover, on the InGaN layer 11, a lower clad layer 12 (nitride semiconductor layer containing Al) composed of AlGaN is formed so as to contact with the upper plane of the InGaN layer 11. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011119374(A) 申请公布日期 2011.06.16
申请号 JP20090274088 申请日期 2009.12.02
申请人 SHARP CORP 发明人 OTA MASATAKA;KAMIKAWA TAKESHI
分类号 H01S5/343 主分类号 H01S5/343
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