发明名称 SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 A stable and highly reliable device for detecting damage or contact failures of respective parts is provided. The device includes a processing chamber for processing a substrate; a heater for heating the substrate; a substrate support accommodating the heater and installed inside the processing chamber; a shaft for supporting the substrate support; a wire inserted through the shaft; a supporting unit for holding the wire; and a temperature detector connected to the supporting unit.
申请公布号 US2011139070(A1) 申请公布日期 2011.06.16
申请号 US20100964921 申请日期 2010.12.10
申请人 HITACHI-KOKUSAI ELECTRIC INC. 发明人 NABETA KAZUYA;UKAE NAOKI;TAKESHITA MITSUNORI
分类号 C23C16/52;C23C16/455;C23C16/458;C23C16/46 主分类号 C23C16/52
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