发明名称 |
SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE |
摘要 |
A stable and highly reliable device for detecting damage or contact failures of respective parts is provided. The device includes a processing chamber for processing a substrate; a heater for heating the substrate; a substrate support accommodating the heater and installed inside the processing chamber; a shaft for supporting the substrate support; a wire inserted through the shaft; a supporting unit for holding the wire; and a temperature detector connected to the supporting unit.
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申请公布号 |
US2011139070(A1) |
申请公布日期 |
2011.06.16 |
申请号 |
US20100964921 |
申请日期 |
2010.12.10 |
申请人 |
HITACHI-KOKUSAI ELECTRIC INC. |
发明人 |
NABETA KAZUYA;UKAE NAOKI;TAKESHITA MITSUNORI |
分类号 |
C23C16/52;C23C16/455;C23C16/458;C23C16/46 |
主分类号 |
C23C16/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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