| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate measuring method capable of measuring a shape of a fine periodic structure highly accurately with high throughput. SOLUTION: This method includes processes for: selecting an attention parameter from shape parameters on a shape of a unit structure constituting a periodic structure, and determining a measurement condition for measuring the shape of the unit structure corresponding to the attention parameter; allowing an electromagnetic wave to enter the periodic structure, while changing an azimuth angle in a plane parallel to a reference plane on a substrate on which the periodic structure is formed following the determined measurement condition; and detecting the electromagnetic wave scattered to the azimuth angle direction which is a direction parallel to the reference plane and an elevation angle direction which is a direction vertical to the reference plane by reflection by the periodic structure. The measurement condition is determined via calculation of a scattering profile showing a scattering intensity distribution of the electromagnetic wave by reflection by the periodic structure, and optimization corresponding to a comparison result acquired from comparison of each scattering profile at every time when a value of the attention parameter is changed. COPYRIGHT: (C)2011,JPO&INPIT |
