发明名称 MICRO ELECTRO MECHANICAL SYSTEM
摘要 In order to provide a technology capable of suppressing degradation of measurement accuracy due to fluctuation of detection sensitivity of an MEMS by suppressing fluctuation in natural frequency of the MEMS caused by a stress, first, fixed portions 3a to 3d are displaced outward in a y-direction of a semiconductor substrate 2 by deformation of the semiconductor substrate 2. Since a movable body 5 is disposed in a state of floating above the semiconductor substrate 2, it is not affected and displaced by the deformation of the semiconductor substrate 2. Therefore, a tensile stress (+&sgr;1) occurs in the beam 4a and a compressive stress (−&sgr;2) occurs in the beam 4b. At this time, in terms of a spring system made by combining the beam 4a and the beam 4b, increase in spring constant due to the tensile stress acting on the beam 4a and decrease in spring constant due to the compressive stress acting on the beam 4b are offset against each other.
申请公布号 US2011138912(A1) 申请公布日期 2011.06.16
申请号 US200913058862 申请日期 2009.08.05
申请人 DEGAWA MUNENORI;JEONG HEEWON 发明人 DEGAWA MUNENORI;JEONG HEEWON
分类号 G01C19/5733 主分类号 G01C19/5733
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