| 摘要 |
In order to provide a galvanizing method which can be used to electroplate and simultaneously passivate conductive objects easily and cost-effectively a substrate is immersed into a galvanizing bath which comprises ions of at least one metal for electrochemical deposition on the substrate surface, ions of at least one transition metal, and a solvent, the substrate forming the cathode of an electrochemical cell; a voltage is applied to the electrochemical cell, producing a current flow that leads to the deposition at least of the at least one metal on the substrate surface; the current flow is interrupted after the deposition of the at least one metal; and subsequently a potential is generated at the cathode, or an additional electrode which is made of the material of the substrate and may be conductively connected to the substrate is immersed in the galvanizing bath, and said potential is maintained or said electrode remains immersed for a time period. |
