| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which uses a plurality of substrate holding tools and verifies a holding condition of a substrate even if the transfer/collection position is not just under the reaction furnace, collects a normal substrate from one substrate holding tool when the one substrate holding tool detects failure and also collects the normal substrate from the other substrate holding tool. SOLUTION: The substrate processing apparatus includes a plurality of substrate holding tools 21a, 21b to hold a substrate 7, a reaction furnace 11 for conducting a predetermined process to the substrate 7, a substrate transfer device 41 to transfer and collect the substrate 7 for the substrate holding tools 21a, 21b, an identifying means for identifying the substrate holding tools 21a, 21b, a detecting device for detecting the holding condition of the substrate 7, and a control device for controlling the substrate transfer device 41. When the detecting device detects failure with the substrate 7, the control device collects the substrate 7 with the substrate transfer device 41 based on the detected holding condition of the substrate 7 and the identification result of the identifying means. COPYRIGHT: (C)2011,JPO&INPIT
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