发明名称 |
Metrology for Extreme Ultraviolet Light Source |
摘要 |
An extreme ultraviolet light system includes a drive laser system that produces an amplified light beam; a target material delivery system configured to produce a target material at a target location; a beam delivery system configured to receive the amplified light beam emitted from the drive laser system and to direct the amplified light beam toward the target location; and a metrology system. The beam delivery system includes converging lens configured and arranged to focus the amplified light beam at the target location. The metrology system includes a light collection system configured to collect a portion of the amplified light beam reflected from the converging lens and a portion of a guide laser beam reflected from the converging lens. The light collection system includes a dichroic optical device configured to optically separate the portions.
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申请公布号 |
US2011141865(A1) |
申请公布日期 |
2011.06.16 |
申请号 |
US20090637961 |
申请日期 |
2009.12.15 |
申请人 |
CYMER INC. |
发明人 |
SENEKERIMYAN VAHAN;KIM NAM-HYONG;BERGSTEDT ROBERT A.;FOMENKOV IGOR V.;PARTLO WILLIAM N. |
分类号 |
G11B20/00;G11B7/00 |
主分类号 |
G11B20/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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