发明名称 Metrology for Extreme Ultraviolet Light Source
摘要 An extreme ultraviolet light system includes a drive laser system that produces an amplified light beam; a target material delivery system configured to produce a target material at a target location; a beam delivery system configured to receive the amplified light beam emitted from the drive laser system and to direct the amplified light beam toward the target location; and a metrology system. The beam delivery system includes converging lens configured and arranged to focus the amplified light beam at the target location. The metrology system includes a light collection system configured to collect a portion of the amplified light beam reflected from the converging lens and a portion of a guide laser beam reflected from the converging lens. The light collection system includes a dichroic optical device configured to optically separate the portions.
申请公布号 US2011141865(A1) 申请公布日期 2011.06.16
申请号 US20090637961 申请日期 2009.12.15
申请人 CYMER INC. 发明人 SENEKERIMYAN VAHAN;KIM NAM-HYONG;BERGSTEDT ROBERT A.;FOMENKOV IGOR V.;PARTLO WILLIAM N.
分类号 G11B20/00;G11B7/00 主分类号 G11B20/00
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