FILM DEPOSITION SYSTEM AND FILM DEPOSITION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a film deposition system and a film deposition method which can safely perform film deposition when a thin film is deposited with a film deposition raw material dangerous when being reacted with water. SOLUTION: The film deposition system 1 includes: a vacuum chamber 2 storing a base material 9 as the object for film deposition in the inside; a holder 4 holding the base material 9 in the vacuum chamber 2; an evaporation source 3 provided at a position opposing to the holder 4; and a circulation mechanism 40 circulating a refrigerant in the inside of the holder 4. Then, a non-aqueous refrigerant is used as the refrigerant circulated in the inside of the holder 4 in the film deposition system 1. With such constitution, a film deposition raw material evaporated by the evaporation source 3 can be deposited on the surface of the base material 9 while cooling the base material 9 held by the holder 4, and safety can be secured upon the film deposition. COPYRIGHT: (C)2011,JPO&INPIT