发明名称 |
COMBINATORIAL TYPE PLASMA PROCESS TESTING METHOD, AND INCLINED PLASMA GENERATING DEVICE |
摘要 |
<P>PROBLEM TO BE SOLVED: To easily optimize external conditions of a plasma process. <P>SOLUTION: There is provided a small-sized plasma generating device capable of establishing a state in which a plasma density is different depending on positions as shown in 4.A, and a radical density is different depending on positions as shown in 4.B. In this small-sized plasma generating device, an object to be processed by the plasma process and a material-forming substrate are arranged, and the plasma process is executed while measuring the plasma density and the radical density on a surface of the processed object. Resultant products of the plasma process are evaluated by positions and the plasma density and the radical density are decided at the positions at the highest evaluations. Moreover, in another large-sized or batch type plasma process, external conditions are adjusted so as to create those optimum plasma density and radical density. These adjustments need no plasma processing and the like for the processed object etc. <P>COPYRIGHT: (C)2011,JPO&INPIT |
申请公布号 |
JP2011119030(A) |
申请公布日期 |
2011.06.16 |
申请号 |
JP20080081959 |
申请日期 |
2008.03.26 |
申请人 |
NAGOYA UNIV;OSAKA UNIV;KYUSHU UNIV |
发明人 |
HORI MASARU;SEKINE MAKOTO;SETSUHARA YUICHI;SHIRATANI MASAHARU |
分类号 |
H05H1/00;H01L21/3065;H05H1/24;H05H1/46 |
主分类号 |
H05H1/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|