发明名称 METHOD FOR FABRICATING OF FILM HAVING MICRO UNEVENNESS
摘要 PURPOSE: A method for manufacturing a film with a micro concave-convex structure is provided to prevent the bonding phenomenon of a mask and a film in a mask eliminating process. CONSTITUTION: A film(12) is supported under a vacuum condition. A mask(14) with a nano concave-convex pattern is manufactured and is integrated with heat source. The mask is primarily heated to temperature at which the surface of a film is melted. The mask is secondarily heated after the mask is in contact with the surface of the film. The nano concave-convex pattern is formed on the surface of the film. The mask is eliminated from the film.
申请公布号 KR101041476(B1) 申请公布日期 2011.06.16
申请号 KR20100084628 申请日期 2010.08.31
申请人 SUN SEMICONDUCTOR 发明人 HAN, SUK BIN;CHOI, YONG GYOO
分类号 G02B5/30;B29C59/02;G02B1/11;G02B5/20 主分类号 G02B5/30
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