发明名称 |
METHOD FOR FABRICATING OF FILM HAVING MICRO UNEVENNESS |
摘要 |
PURPOSE: A method for manufacturing a film with a micro concave-convex structure is provided to prevent the bonding phenomenon of a mask and a film in a mask eliminating process. CONSTITUTION: A film(12) is supported under a vacuum condition. A mask(14) with a nano concave-convex pattern is manufactured and is integrated with heat source. The mask is primarily heated to temperature at which the surface of a film is melted. The mask is secondarily heated after the mask is in contact with the surface of the film. The nano concave-convex pattern is formed on the surface of the film. The mask is eliminated from the film. |
申请公布号 |
KR101041476(B1) |
申请公布日期 |
2011.06.16 |
申请号 |
KR20100084628 |
申请日期 |
2010.08.31 |
申请人 |
SUN SEMICONDUCTOR |
发明人 |
HAN, SUK BIN;CHOI, YONG GYOO |
分类号 |
G02B5/30;B29C59/02;G02B1/11;G02B5/20 |
主分类号 |
G02B5/30 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|