PHOTO-CURABLE RESIN COMPOSITION, AND PATTERN FORMING METHOD, SUBSTRATE PROTECTING FILM, FILM-SHAPED ADHESIVE AND ADHESIVE SHEET USING SAID COMPOSITIONS

摘要

PURPOSE: A photo-crosslinkable resin composition, a pattern formation method using thereof, and a protective coat film and a film-shaped adhesive using thereof are provided to secure the excellent heat resistance, chemical resistance, and flexibility of the photo-crosslinkable resin composition. CONSTITUTION: A photo-crosslinkable resin composition contains the following: polyimide-silicone having a primary alcoholic hydroxyl group; an amino condensation product modified by formalin or formalin-alcohol; more than one compound selected from phenolic compounds with more than two methylol groups or alkoxy methylol groups; and a photoacid generator. The polyimide-silicone is marked with chemical formula 1. In the chemical formula 1, k and m are fixed numbers.