APPARATUS FOR WAFER CONTAINER

摘要

PURPOSE: An apparatus for storing wafers is provided to prevent the formation of natural oxide films on wafers by introducing dysoxidative or inert gas into a water case to eliminate impurities in the wafer case. CONSTITUTION: A body(420) is combined with the lower surface of a station. An elastic unit(430) is vertically arranged along the inner circumference of a space(423). A gas introducing pipe(410) is inserted into the lower side of an inlet(421) in order to supply gas. A port introducing pad(450) is formed based on a material for increasing the bondability with respect to a water container introducing pad. A load sensor(460) includes a load detecting part(462) and a load sensor part(461).