| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an active ray sensitive or radiation sensitive resin composition for forming a pattern having excellent roughness characteristics and dry etching resistance when an ArF excimer laser, an electron beam, an X-ray, an EUV and the like are used as an exposure light source, and also to provide a pattern forming method using the composition. <P>SOLUTION: The active ray sensitive or radiation sensitive resin composition includes: a resin (P) having a recurring unit (A) including a portion decomposed by irradiation with an active ray or a radiation and generating an acid anion in a side chain of the resin, wherein the recurring unit (A) has a ≥7C aromatic ring on a portion except the acid anion generating portion on the side chain having the acid anion generating portion. <P>COPYRIGHT: (C)2011,JPO&INPIT |
