发明名称 SUBSTRATE HOLDING DEVICE AND PLASMA PROCESSING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a device capable of speedily cooling a substrate to a target temperature and performing uniform cooling. SOLUTION: An ESC stage is provided with an inner region 25 and an outer region 26 into which a heat transfer gas can be introduced, and an exhaust groove 30 is provided therebetween. An exhaust region is in a shape of a groove sandwiched between an inner peripheral partition 34 for the inner region 25 and an intermediate partition 29 for the outer region 26, and the inner region and the outer region are exhausted through the inner peripheral partition 34 and the intermediate partition 29. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011119708(A) 申请公布日期 2011.06.16
申请号 JP20100244221 申请日期 2010.10.29
申请人 CANON ANELVA CORP 发明人 KODAIRA KICHIZO;KOSUGI HIROSHI
分类号 H01L21/683;H01L21/3065;H01L21/31 主分类号 H01L21/683
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