| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a photocurable pressure-sensitive adhesive composition formable of a pressure-sensitive adhesive layer which does not cause squeeze-out of glue or the like under ordinary temperature and pressure conditions, has sufficient initial tack via drying and cross-linking, is easily cured by irradiation with light, and exhibits high peeling resistance after curing, to provide a photocurable pressure-sensitive adhesive layer, and to provide a photocurable pressure-sensitive adhesive sheet or the like. <P>SOLUTION: The photocurable pressure-sensitive adhesive composition contains: a graft polymer, obtained by graft-polymerizing a chain including a cyclic ether group-containing monomer to a (meth)acrylic polymer containing a hydroxyalkyl(meth)acrylamide monomer in an amount of 0.2-10 wt.% as monomer unit, and a photo-cationic polymerization initiator. The photocurable pressure-sensitive adhesive layer using the composition, and the photocurable pressure-sensitive adhesive sheet with the adhesive layer are provided. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
