| 摘要 |
In a liquid crystal array inspection that acquires an imaging picture by scanning a liquid crystal substrate in a two-dimensional manner with an electron beam to inspect a liquid crystal substrate array based on the imaging picture, the imaging picture obtained by imaging a stage with the electron beam is used to determine the amounts of displacement of an imaging range of each electron gun in an X direction and a Y direction. Amounts of correction for correcting displacements of the imaging range of each electron gun in the X direction and the Y direction are calculated according to the determined amounts of displacement. The displacement in the X direction is corrected by controlling the scanning with the electron beam in the X direction, and the displacement in the Y direction is corrected by aligning a mounting position of each electron gun in the Y direction.
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