发明名称 Überhöhungsstruktur zur Erzeugung von Drahtformungsgebieten
摘要 A bank structure in which a recess corresponding to a pattern formed of a functional liquid is provided includes first recess provided corresponding to a first pattern, and a second recess provided on part of the first recess and corresponding to a second pattern. The second recess has a shape that has a width larger than a width of the first recess and has a circular arc in at least part of an outer circumference of the second recess.
申请公布号 DE602005027789(D1) 申请公布日期 2011.06.16
申请号 DE20056027789T 申请日期 2005.09.27
申请人 SEIKO EPSON CORP. 发明人 HIRAI, TOSHIMITSU;SAKAI, SHINRI
分类号 H05K3/12;H01L27/32 主分类号 H05K3/12
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