发明名称 |
Überhöhungsstruktur zur Erzeugung von Drahtformungsgebieten |
摘要 |
A bank structure in which a recess corresponding to a pattern formed of a functional liquid is provided includes first recess provided corresponding to a first pattern, and a second recess provided on part of the first recess and corresponding to a second pattern. The second recess has a shape that has a width larger than a width of the first recess and has a circular arc in at least part of an outer circumference of the second recess. |
申请公布号 |
DE602005027789(D1) |
申请公布日期 |
2011.06.16 |
申请号 |
DE20056027789T |
申请日期 |
2005.09.27 |
申请人 |
SEIKO EPSON CORP. |
发明人 |
HIRAI, TOSHIMITSU;SAKAI, SHINRI |
分类号 |
H05K3/12;H01L27/32 |
主分类号 |
H05K3/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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