发明名称 TREATMENT DEVICE FOR SUBSTRATE
摘要 <p>PURPOSE: A substrate processing apparatus is provided to prevent the generation of time interference while loading and unloading processes by adjusting a loading timing and an unloading timing during a substrate processing process. CONSTITUTION: A loading and unloading part(200) loads and unloads substrates. A circulating rail(300) is arranged between the loading and unloading part and a processing part. A plurality of transferring parts(400) is transferred along the circulating rail and supplies loaded substrates to the processing part. The transferring parts unload processed substrates and supply the processed substrate to the loading and unloading part.</p>
申请公布号 KR20110065608(A) 申请公布日期 2011.06.16
申请号 KR20090122171 申请日期 2009.12.10
申请人 K.C.TECH CO., LTD. 发明人 YUN, GEUN SIK
分类号 H01L21/677;H01L21/673 主分类号 H01L21/677
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