发明名称 PLASMAMINDERUNGSVORRICHTUNG
摘要 A plasma abatement device comprises a gas chamber having a gas inlet for receiving a gas to be treated by the device and a gas outlet, at least part of the inner surface of the gas chamber being formed from, or coated with, an electrically conductive material that is resistant to corrosion during treatment of a gas containing a halocompound and water vapour.
申请公布号 AT509694(T) 申请公布日期 2011.06.15
申请号 AT20060779493T 申请日期 2006.09.21
申请人 EDWARDS LIMITED 发明人 RADOIU, MARILENA
分类号 B01J19/12;B01D53/32;C23C16/44;H05H1/24 主分类号 B01J19/12
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