| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a semiconductor imaging device which curtails the number of steps at a low cost in a waveguide forming step of the semiconductor imaging device having an optical waveguide. SOLUTION: The method for manufacturing the semiconductor imaging device has steps of: forming organic/inorganic hybrid films 108 and 109 on a semiconductor substrate 101 so as to decrease an oxygen density from the lower layer towards the upper layer; forming an aperture part 111 in the organic/inorganic hybrid films 108 and 109; irradiating an oxygen radical and a nitrogen radical to form an oxide layer 113 so as to spread continuously from a lower part of the aperture part 111 to an upper part thereof; and forming an aperture part 114 by removing the oxide layer 113. COPYRIGHT: (C)2011,JPO&INPIT
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