发明名称 |
METHOD OF CONTROLLING A SEOI DRAM MEMORY CELL HAVING A SECOND CONTROL GATE BURIED UNDER THE INSULATING LAYER |
摘要 |
PURPOSE: A method for controlling a semiconductor-on-insulator(SeOI) dynamic random access memory(DRAM) is provided to reduce the number of decoders using a memory cell with a unitized rear side controlling gate. CONSTITUTION: A front side controlling gate(8) is arranged on the upper side of a channel and is separated from the channel by a gate dielectric(7). A rear side controlling gate(9) is arranged in a base substrate and is separated from the channel by the insulating layer. A first voltage is applied to the front side controlling gate, and a second voltage is applied to the rear side controlling gate. The front side controlling gate and the rear side controlling gate are simultaneously used.
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申请公布号 |
KR20110065316(A) |
申请公布日期 |
2011.06.15 |
申请号 |
KR20100106797 |
申请日期 |
2010.10.29 |
申请人 |
S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES |
发明人 |
MAZURE CARLOS;FERRANT RICHARD |
分类号 |
H01L21/8242;H01L27/108 |
主分类号 |
H01L21/8242 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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