发明名称 METHOD OF CONTROLLING A SEOI DRAM MEMORY CELL HAVING A SECOND CONTROL GATE BURIED UNDER THE INSULATING LAYER
摘要 PURPOSE: A method for controlling a semiconductor-on-insulator(SeOI) dynamic random access memory(DRAM) is provided to reduce the number of decoders using a memory cell with a unitized rear side controlling gate. CONSTITUTION: A front side controlling gate(8) is arranged on the upper side of a channel and is separated from the channel by a gate dielectric(7). A rear side controlling gate(9) is arranged in a base substrate and is separated from the channel by the insulating layer. A first voltage is applied to the front side controlling gate, and a second voltage is applied to the rear side controlling gate. The front side controlling gate and the rear side controlling gate are simultaneously used.
申请公布号 KR20110065316(A) 申请公布日期 2011.06.15
申请号 KR20100106797 申请日期 2010.10.29
申请人 S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES 发明人 MAZURE CARLOS;FERRANT RICHARD
分类号 H01L21/8242;H01L27/108 主分类号 H01L21/8242
代理机构 代理人
主权项
地址