| 摘要 |
PURPOSE: A magnet unit for a magnetron sputter electrode and sputtering apparatus are provided to change an erosion pitch with a simple operation since the linear gap between a central magnet and a surrounding magnet can be changed without separating the magnet unit from the sputtering apparatus. CONSTITUTION: A magnet unit for a magnetron sputter electrode is as follows. In a state a direction of facing a substrate from targets facing each other in a sputter chamber is above, a tunnel shape of magnet is formed on the upper part of the target by being arranged on the lower part of the target. A magnet unit(5) comprises a central magnet(52) arranged on the line in the length direction of the target and a surrounding magnet(53), which consists of a straight unit(53a) stretched in parallel to both sides of the central magnet and a corner unit connecting both ends of the straight unit, changing the polarity of the target. A change unit makes relative movement to the central magnet and the straight unit of the surrounding magnet and can change the gap between the central magnet and the surrounding magnet. |
