WAFER CLEANING APPARATUS

摘要

PURPOSE: A wafer cleaning apparatus is provided to clean a wafer while keeping the wet surface of the wafer during fixed wafer waiting time, thereby increasing the quality of the wafer. CONSTITUTION: A bath(100) provides a space for containing pure water. A cassette(400) is installed in the bath and successively receives a wafer. A pure water supply device(300) supplies the pure water into the bath. An elevating device(200) comprises a support unit(230) and a driving unit(210) supporting the lower part of the cassette. The driving unit supplies power to a driving shaft(220).