发明名称 WAFER CASSETTE FOR HIGH DENSITY PLASMA CHEMICAL VAPOR DEPOSITION
摘要 PURPOSE: A wafer cassette for high density plasma chemical vapor deposition is provided to form a heat-resistant coating layer on one side of a slot, thereby preventing deformation due to melting. CONSTITUTION: A cassette main body(110) is made of a square plastic material whose top is opened to perform high density plasma chemical vapor deposition. A plurality of cassette slots(120) supports a plurality of wafers(20) on both sides of the cassette main body. A heat-resistant coating layer is formed on one side of a cassette slot. The heat-resistant coating layer is made of stainless steel.
申请公布号 KR20110064589(A) 申请公布日期 2011.06.15
申请号 KR20090121262 申请日期 2009.12.08
申请人 DONGBU HITEK CO., LTD. 发明人 MOON, JEONG WOONG
分类号 H01L21/673;B65D85/38;B65D85/86 主分类号 H01L21/673
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